EUV Lithography Market Size, Share & Industry Analysis, By Equipment (Light Source, Optics, Mask, and Others), By End-user (Integrated Device Manufacturer and Foundries), and Regional Forecast, 2026 – 2034

Last Updated: January 19, 2026 | Format: PDF | Report ID: FBI113102

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ATTRIBUTE	DETAILS
Study Period	2021-2034
Base Year	2025
Estimated Year	2026
Forecast Period	2026-2034
Historical Period	2021-2024
Growth Rate	CAGR of 8.28% from 2026 to 2034
Unit	Value (USD Billion)
Segmentation	By Equipment Light Source Optics Mask Others (Mirror, etc.) By End-user Integrated Device Manufacturer Foundries By Region North America (By Equipment, End-user, and Country) U.S. Canada Mexico South America (By Equipment, End-user, and Country) Brazil Argentina Rest of South America Europe (By Equipment, End-user, and Country) Germany France Italy Spain Russia Benelux Nordics Rest of Europe Middle East & Africa (By Equipment, End-user, and Country) Turkey Israel GCC South Africa North Africa Rest of the Middle East & Africa Asia Pacific (By Equipment, End-user, and Country) China India Japan South Korea ASEAN Oceania Rest of Asia Pacific
Companies Profiled in the Report	ASML (Netherlands), Samsung Electronics Co. Ltd. (South Korea), Canon Inc. (Japan), KLA Corporation (U.S.), NTT Advanced Technology Corporation (Japan), Nikon Corporation (China), ZEISS Group (Germany), ADVANTEST CORPORATION (Japan), SUSS MicroTec SE (Germany)